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利用自主改进后的能量过滤磁控溅射(energy filtering magnetron sputtering,EFMS)技术制备Te薄膜,研究了沉积温度对薄膜结晶特性、表面形貌以及光学性能的影响。研究结果表明所制备的薄膜为纯Te膜。在100℃时制备出的薄膜结晶较好,表面颗粒较大且比较均匀,200℃时薄膜表面形貌发生改变,由颗粒状变为交错分布的棒状结构。200℃时制备的薄膜在红外波段的消光系数和折射率相对较小。室温制备的薄膜的平均透过率为9.1%;200℃制备的薄膜的平均透过率最大为35.4%。
Abstract：Te films were prepared by energy filtering magnetron sputtering(EFMS), a self-improved magnetron sputtering technology. The effects of deposition temperature on the crystallization characteristics, surface morphology and optical properties of the films were investigated. The results showed that the film prepared by EFMS was pure Te film.The Te film crystallized well at the deposition temperature of 100 ℃, and the film particles simultaneously were larger and more uniform than others. At the deposition temperature of 200 ℃, the surface of the Te film changed from granular to staggered rod-like structure. The extinction coefficient and refractive index of the Te film in the infrared band were relatively smaller than others. The average transmittance of the Te film was 35.4%, the largest at 200 ℃ and 9.1% at room temperature.
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基本信息:
DOI：10.13705/j.issn.1671-6841.2019163
中图分类号:O484.41
引用信息:
[1]张世慧,姚宁,田维民,等.能量过滤磁控溅射技术制备Te薄膜及其光学性能研究[J],2020,52(02):102-107.DOI:10.13705/j.issn.1671-6841.2019163.
基金信息:
河南省重点科技攻关计划项目(152102210038)
2019-05-09
2019
2019-06-28
2019
1